Just a quickie - i am setting up to do some machine monitoring using a long run of repeat acquisitions on Si "metal".
I'm not sure which beam conditions to use, to save me time can someone let me know if pure Si is beam sensitive ?
Hi Richard,
This reminds me of the beam sensitivity issue in SiO2 glass versus SiO2 quartz as seen in the image attached below. What's weird (in a way) is that SiO2 crystal (quartz) is much more sensitive to beam damage than SiO2 glass. I guess the glass SiO2 molecules are already disorganized!
To return to your question, normally we don't think of Si metal as beam sensitive, though there may be some trace dopant (boron) migration issues in semiconductor grade Si which I have not investigated. However I can tell you this:
I *have* seen beam damage in pure Si metal after the sample was re-polished with colloidial silica. After a few seconds of polishing the carbon contamination disappeared but some little tiny beam damage marks became visible in a grid pattern where my standardization had been performed.
I believe this is from the chemical etching aspect of the colloidial silica polish which will attack the more structurally damaged areas preferentially.
I will also note as an aside that I often see that the carbon coating is particularly difficult to remove from our Si standards- I wonder if the carbon bonds especially well to the Si surface? I often find little "leftover" patches of carbon coat on our Si metal after colloidial silica polishing, but not on our other metal standards.